RCA 1 Radio Corporation of America


RCA 1 Radio Corporation of America : Also called RCA-2 and HPM. A process for cleaning silicon wafers used in electronics. They are washed successively by three solutions. The first is an alkaline solution of hydrogen peroxide, which oxidizes organic matter. The second is an acid fluoride solution which removes silica. The third is an acid solution of hydrogen peroxide which removes transition metals
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